K-Patents will introduce a third Generation Semicon Refractometer PR-33-S at the Semicon West show. The PR-33-S refractometer monitors and measures the liquid chemical concentrations throughout the whole semiconductor fabrication process, i.e. from chemical supplies down to fab in-line and tool in-situ chemical quality control.
The new PR-33-S is specifically designed for the ultra-clean environments and integrated process tools. The PR-33-S monitors the chemical concentrations in real-time and provides an Ethernet output signal and immediate feedback, if the chemical is not within the specifications. The concentration is determined by making an optical measurement of the solution's Refractive Index.
The advantage of this principle is that the same instrument can be used to measure any chemical. The PR-33-S consists of an ultra-pure PVDF sensor and an Ethernet connection, connectors and cabling that any standard PoE (Power over Ethernet) switch can use for transmitting power to the sensor and data to a computer. The average payback time for this refractometer is 3-6 months.
Typical uses for K-Patents Semicon Refractometers:
- Preventing wrong chemicals or wrong concentrations from entering the fabrication process.
- Optimizing etch process and increasing etch solution's bath life (e.g. heated KOH).
- Increasing wafer throughput, typically by +25%, and reducing cleaning chemical consumption (e.g. SC-1 or EKC-265) in FEOL and BEOL cleaning.
- Achieving tight control of CMP slurries and better uniformity of the planarization process.